Products

Oxide silicon wafer

Thick film thermal oxide film from KST WorldTo obtain the world's highest market share with superior surface cleanliness and stable quality.

未标题-1.jpg

Thick film thermal oxide film from KST WorldTo obtain the world's highest market share with superior surface cleanliness and stable quality.

未标题-1.jpg

Introduction

Thick film thermal oxidation film" purpose
Undercladding wafer for AWG
SiO2 films called Under clad layers are critical to yield in array waveguide gratings (AWG).

59356d7e14500.jpg

§ Guarantee specifications

project

specifications

Film thickness

20um±5%

Maximum film thickness)

In-plane homogeneity

±0.5%

Interfacial homogeneity

±0.5%

The refractive index (@ 1550 nm)

1.4458±0.0001

§ Standard list

size

The thickness of the wafer

Thermal oxide film thickness

4inch

525um 1mm

15um、20um

6inch

625um 675um 1mm

15um、20um

8inch

725um

15um、20um

12inch

775um

15um

Other wafer sizes and film thickness can be customized (thickness range: 0.1-30 m)
§ The surface roughness data is distributed in the refractive index plane


圖片1.png    

§ Clean room

未标题-1.jpg      

Thick film thermal oxidation film" purpose
Undercladding wafer for AWG
SiO2 films called Under clad layers are critical to yield in array waveguide gratings (AWG).

59356d7e14500.jpg

§ Guarantee specifications

project

specifications

Film thickness

20um±5%

Maximum film thickness)

In-plane homogeneity

±0.5%

Interfacial homogeneity

±0.5%

The refractive index (@ 1550 nm)

1.4458±0.0001

§ Standard list

size

The thickness of the wafer

Thermal oxide film thickness

4inch

525um 1mm

15um、20um

6inch

625um 675um 1mm

15um、20um

8inch

725um

15um、20um

12inch

775um

15um

Other wafer sizes and film thickness can be customized (thickness range: 0.1-30 m)
§ The surface roughness data is distributed in the refractive index plane


圖片1.png    

§ Clean room

未标题-1.jpg      

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